铌酸锂(LiNbO3)晶体 Wafer
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E-mail waferhome@hotmail.comSpecification for 铌酸锂(LiNbO3)晶体 Wafer
Grade | Dimeter | Type/dopant |
Orientaion |
crystal struction | spectrum penetrate wave length | spectrum refraction rate | Resistivity(1) | Resistivity(2) | Flat |
Surface/Roughness | Geometric parameter |
---|---|---|---|---|---|---|---|---|---|---|---|
铌酸锂(LiNbO3)晶体 wafer | 25.4mm 50.8mm 76.5mm 100mm |
Zn/Er/intrinsic | X Y Z cut |
Trigonal | 0.4~2.90μm | n0=2.286 ne=2.203 @632.8nm | 1 - 9 *E10 ohm-cm | N/A 16mm 22.5mm 32.5mm | polished/etched polished/polished | TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um | |
钽酸锂(LiTaO3)晶体 wafer | 25.4mm 50.8mm 76.5mm 100mm | intrinsic/Mg/Fe | X Y Z cut | hexagonal | 0.4~5.0 um | no = 2.176 ne= 2.180 @ 633 nm | 0.9 - 9 *E11 ohm-cm | 1.0*E11 - 9.9 *E19 ohm-cm |
N/A 16mm 22.5mm 32.5mm | polished/etched polished/polished | TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um |
锗酸铋(Bi4Ge3O12)晶体 wafer | 25.4mm 50.8mm 76.5mm 100mm | intrinsic/Mg/Fe | X Y Z cut | hexagonal | 0.4~5.0 um | no = 2.176 ne= 2.180 @ 633 nm | 0.9 - 9 *E11 ohm-cm | 1.0*E11 - 9.9 *E19 ohm-cm |
N/A 16mm 22.5mm 32.5mm | polished/etched polished/polished | TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um |
硅酸铋(BOS)晶体 wafer | 25.4mm 50.8mm 76.5mm 100mm | intrinsic/Mg/Fe | X Y Z cut | hexagonal | 0.4~5.0 um | no = 2.176 ne= 2.180 @ 633 nm | 0.9 - 9 *E11 ohm-cm | 1.0*E11 - 9.9 *E19 ohm-cm |
N/A 16mm 22.5mm 32.5mm | polished/etched polished/polished | TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um |
硅酸镓镧(LGS) | 25.4mm 50.8mm 76.5mm 100mm | Y- cut; Rotated Y-cut on 1º….2º +/-0,02º | Trigonal |
|
N/A 16mm 22.5mm 32.5mm | polished/etched polished/polished | TTV < 5um TIR <3um STIR < 2um BOW < 10um Warp < 20um |